Datové sady / Denton E-beam Evaporator #1


Denton E-beam Evaporator #1

Vydavatel Federal Laboratory Consortium

Datum vydání před téměř 10 roky

US
beta

Shrnutí

Co poskytovatel nabízí?
a one-off release of a set of related datasets

Databázová licence
Nevztahuje se

Licence na obsah
Creative Commons CCZero

Způsob ověření
ověřený automaticky

Popis

Description: CORAL Name: E-Beam Evap 1 This is a dual e-beam/thermal evaporator for the deposition of metal and dielectric thin films. Materials available are: Ag, Al, Au, Co, Cr, Cu, Fe, Gd, Mo, Ni, Pd, Permalloy, Pt, Ta, Ti, W, Y, Yb, Al 2O 3, C, MgO, Si, SiO 2, TiO 2. Specifications / Capabilities: 6-pocket electron gun Two electrodes for thermal sources Wafers from 50 to 150mm Capacity: 4 wafers Cryopumped with a base vacuum of 8E-8T Uniformity shield yielding thickness uniformity of 5% over 100mm wafers Scientific Opportunities / Applications: Metallization for electrical contacts Dry etch masks Lift-off processes Magnetic studies