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Description: CORAL Name: Nanoimprinter This tool creates a pattern in a thin resist by embossing from a mold. The pattern is later transferred to the wafer by reactive ion etching. Specifications / Capabilities: Pieceparts up to 150 mm wafers Nitrogen cushion pressure ensures uniformity Imprint temperatures from room to 300 °C Heating rate >5 °C/s Cooling rate >2 °C/s Capable of UV-curvable as well as thermoplastic resists High throughput: capable of <60 s per wafer Feature size down to 10 nm Scientific Opportunities / Applications: Nanoscale patterning Polymer or Sol-gel nano device fabrication Polymer property study