bronzová úroveň ověřený automaticky US beta

Úroveň certifikace: bronzová úroveň 22 October 2015 Co to v praxi znamená: Datová sada splňuje základní požadavky na otevřená data.

Cost Reduction of IMM Solar Cells by Recycling Substrates Using Wet Chemical Etching Project


Popis

The goal of the program is to reduce the cost of substrate reclaim for high-efficiency solar cells fabricated by an epitaxial lift-off (ELO) process, and to increase the number of reuse cycles for a given substrate. If successful, this will result in a reduction in the cost of GaAs-based multi-junction solar cells, in which the cost of the substrate accounts for approximately 50% of the total cost. The cost reduction is achieved by introducing a new multi-layer etch-stop structure into a inverted metamorphic (IMM) triple-junction cell. The etch-stop structure is grown between the original GaAs substrate and the ELO release layer, thereby becoming the effective substrate surface after the ELO process. The etch-stop structure prevents pits and surface damage that occur during ELO from damaging the surface of the GaAs substrate. The standard method of reclaiming the GaAs substrate after ELO is to employ chemo-mechanical polishing (CMP) to remove the defect-ridden GaAs surface and chemically polish the underlying GaAs to yield a surface that is suitable for epitaxial growth. The CMP process works but reduces the substrate thickness and causes minor wafer damage itself, which requires further polishing. These factors accumulate, in practice limiting the number of reclaim cycles to 5 - 10 for a given substrate. With the incorporation of the proposed etch-stop structure, the defects are isolated in the etch-stop structure, which can be dissolved by successive selective wet chemical etches to produce the original pristine GaAs surface on a substrate of the original thickness. All mechanical polishing is eliminated in this proposed work, ensuring a constant substrate thickness through repeated substrate reclaim cycles and reducing the estimated cost of the recycling process to <$1 per substrate. The Phase I program demonstrated that this method for substrate reclaim works; in Phase II we will develop the reclaim into an optimized batch process.


Obecné informace


Právní informace

Tuto datovou sadu vytvořila vláda Spojených států, což znamená, že je považována za veřejné dílo. Americké autorské právo ale přiznává otevřený přístup pouze americkým občanům, takže předpokládáme, že pro zbytek světa jsou data v souladu s americkou politikou otevřených dat licencována pod CC Zero.
  • Právní prohlášení

    http://catalog.data.gov/dataset/cost-reduction-of-imm-solar-cells-by-recycling-substrates-using-wet-chemical-etching-proje-a1a5c Do you think this data is incorrect? Let us know

  • Under which licence can people outside the US reuse this data?

    Creative Commons CCZero Do you think this data is incorrect? Let us know

  • Obsah chráněný autorským právem

    yes, and the rights are all held by the same person or organisation Do you think this data is incorrect? Let us know

  • Licence obsahu

    Creative Commons CCZero Do you think this data is incorrect? Let us know

  • Strojově čitelná data právního prohlášení

    licence k datům Do you think this data is incorrect? Let us know

  • Ochrana soukromí

    nehraje roli, data se netýkají fyzických osob Do you think this data is incorrect? Let us know


Praktické informace

  • Relevantní datové katalogy

    http://catalog.data.gov/organization/nasa-gov Do you think this data is incorrect? Let us know

  • Zastarávání

    data časem zastarají, ale mají časové razítko Do you think this data is incorrect? Let us know

  • Zálohování dat

    data jsou zálohována offsite Do you think this data is incorrect? Let us know


Technické informace

  • URL datové sady

    http://techport.nasa.gov/xml-api/17847 Do you think this data is incorrect? Let us know

  • Strojová čitelnost

    strojově čitelné Do you think this data is incorrect? Let us know

  • Formát dat

    standardizovaný, otevřený Do you think this data is incorrect? Let us know


Sociální informace

  • Strojově čitelná metadata

    název Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    popis Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    hlavní URL Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    URL dokumentace Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    poskytovatel Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    klíčová slova Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    distribuce Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    datum vydání Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    datum poslední změny Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    související časové období Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata

    jazyk Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata k distribucím

    datum vydání Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata k distribucím

    URL pro přístup k datům Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata k distribucím

    URL datové sady Do you think this data is incorrect? Let us know

  • Strojově čitelná metadata k distribucím

    typ média Do you think this data is incorrect? Let us know

  • Kontakty

    http://catalog.data.gov/dataset/cost-reduction-of-imm-solar-cells-by-recycling-substrates-using-wet-chemical-etching-proje-a1a5c Do you think this data is incorrect? Let us know

  • Zpětná vazba k publikovaným datovým sadám

    http://www.data.gov/issue/?media_url=http://catalog.data.gov/dataset/cost-reduction-of-imm-solar-cells-by-recycling-substrates-using-wet-chemical-etching-proje-a1a5c Do you think this data is incorrect? Let us know